With domestic vertical transistor technology, the chip has achieved a channel length of 0.65nm?

The chip is composed of transistors. Under the same area, the denser the transistors, the more advanced the chip technology. Therefore, the improvement of each generation of chip technology is to shorten the length of the transistor's conduction channel.

The length of the conductive channel of this transistor referred to as the channel length, refers to the process of the chip. For example, the channel length is 5nm, which means that the chip is a 5nm chip.

In order to shorten the channel length, a high-precision lithography machine is required. The higher the accuracy of the lithography machine, the shorter the channel length can be.

But it is undeniable that since the current transistors are basically parallel structures (the transistors are placed in parallel) when the chip reaches the 3nm process, it is more and more difficult to shorten the channel length because it will cause serious problems. The short-channel effect is too high for the accuracy of the lithography machine.

So later, scientists studied another transistor structure, which is a vertical structure (the transistors are placed vertically). The channel length of a vertical transistor is determined only by the thickness of the material, which can greatly shorten the channel. Length, so that the transistors are denser, to achieve a more advanced process, and do not rely on traditional high-precision lithography technology.

However, the theory of this vertical transistor is very good, but the reality is very severe because the metal-semiconductor will form a very unideal contact interface, which will destroy the channel of the entire device, increase the vertical tunneling current, and make the device, not Grid control.

But recently, the research team of Hunan University has adopted low-energy van der Waals electrode integration to realize short-channel vertical devices with a thin layer or even a single atomic layer of molybdenum disulfide as the semiconductor channel, which reduces the tunneling current. Makes this kind of vertical transistor technology enters a new stage.

In the test, the vertical transistor also maintained good characteristics while achieving a channel length of 0.65nm, which means that the chip process can enter the 1nm level.

More importantly, because it is different from parallel transistors, this vertical transistor technology can produce high-process chips without relying on the limitations of high-precision photolithography and etching technology.

At present, relevant papers have been published in the journal Nature Electronics, and there are detailed reports on the official website of Hunan University.

However, please dont get too excited. At present, this is just research. It may take a long time to actually use factory production, but dont complain. The mass production of any technology is based on theoretical research first, and there is no theory. Research, where is the mass production.